Physics Design Engineer - Productivity

One of the Lithography system Performance parameters, becoming a sales flagship, is Productivity of DUV systems. The fact that Productivity performance is completely dependent from both any HW and any SW change in the system, makes the Productivity System parameters Verification and issues Troubleshooting a quite challenging task, which required from the candidate broad technical knowledge and advanced stakeholder management and communication skills.  

The scope of the position is broad as it contains multiple topics related to qualifying, issues solving, optimizing of the DUV systems Productivity performance. As you will be working on predicting, validating and driving solutions to secure Productivity performance and defining the future design features, you will have a direct impact on enabling our external customers to rump-up towards High Volume Manufacturing for Lithography systems.

Overview main activities

• Predict the Productivity performance of scanner in collaboration with System engineering groups
• Validate the Productivity performance of the system during the integration phase by defining integration and test strategy and by analyzing qualification results in close collaboration with Integration/Factory Departments
• Support/participate in System Performance Evaluation, PERT preparation, understanding interdependencies in the system, related to Productivity impact; Interdependencies between Productivity and other System Performance parameters
• Troubleshoot and manage factory/field customer issues including alignment with marketing & program managers
• Drive improvements to enhance the Productivity performance of the next generation of systems 
• Report on system integration productivity progress, test results and the system’s functionality and performance.

Main responsibilities

• Perform simulations to predict system performance on Productivity
• Prepare test and report documentation for platforms qualification
• Analyses and reports on acquired system data
• Review the preliminary design proposals, create the testing methods  and qualify  new software and hardware designs of Functional Clusters on Throughput
• Monitor factory/field (population) data and perform analyses to identify trends and initiate improvement proposals
• Troubleshoot Productivity related issues in the field and factory
• Executes the daily work in accordance with the Productivity team plan
• Interfaces with system test engineers, project leads, PEs, configuration engineers, upgrade integrators and project architects/engineers
• Reports to Productivity Project Leader and Productivity Architect

Technical University PhD/ Master’s (Applied) physics, Optics, Mechanical engineering, Mechatronics, Electrical engineering or equivalent

• Experience in System troubleshooting / System qualification
• Analytical and experimental experience
• Experience in test design and qualification
• Advanced level of Excel (VBA), Matlab and Python is desirable
• Experience/knowledge of software development is preferred

Working at the cutting edge of tech, you’ll always have new challenges and new problems to solve – and working together is the only way to do that. You won’t work in a silo. Instead, you’ll be part of a creative, dynamic work environment where you’ll collaborate with supportive colleagues. There is always space for creative and unique points of view. You’ll have the flexibility and trust to choose how best to tackle tasks and solve problems. To thrive in this job, you’ll need the following Skills:

• Be able to break down complex problems with limited data to come to solutions – strong critical thinking capability with pragmatic attitude.
• Have strong written and oral communication skills and a commitment to achieving results while under time constraints;  High energy, high level of dedication;
• Self-propelling who enjoys working in a dynamic project;
• Be willing to jump in on new issues, get to the bottom of the causes and propose practical solutions;
• A working knowledge of MatLab/Python for data collection and analysis to drive towards conclusions/solutions;  
• Be able to interface with multidisciplinary groups and work effectively in a team and be willing to take on responsibility, follow through and keep multiple simultaneous assignments on schedule
• Ability to interact with various levels of stakeholder: Functional Cluster engineers/architects, project leaders, program managers, marketing, customer support and factory engineers
• Be able to quickly acquire technical knowledge from documentation and on-the-job training and be capable of thoroughly investigating technical issues (analytically and through experiments);

Within ASML the sector Development & Engineering is responsible for the specification and the design of the ASML products. The department System Performance is responsible for timely and cost-effective qualification of overlay, focus, imaging and productivity for functional modules, machines and customer applications. While you will be working in a multidisciplinary project team, in a dynamic and high-tech environment.

This position requires access to controlled technology, as defined in the United States Export Administration Regulations (15 C.F.R. § 730, et seq.). Qualified candidates must be legally authorized to access such controlled technology prior to beginning work. Business demands may require ASML to proceed with candidates who are immediately eligible to access controlled technology.

ASML is an Equal Opportunity Employer that values and respects the importance of a diverse and inclusive workforce. It is the policy of the company to recruit, hire, train and promote persons in all job titles without regard to race, color, religion, sex, age, national origin, veteran status, disability, sexual orientation, or gender identity. We recognize that Diversity and inclusion is a driving force in the success of our company.

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Work Experience: 2-3 years,4-9 years

Travel: No

Education Level: Master,PhD

Employment Type: FULL_TIME

Team: Design Engineering and Architecture

Technical Field: Lithography System Performance